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Study of the Atomic Structures of Si3N4/CeO2-x and Si3N4/SiO2 Interfaces Using STEM and First-Principles Methods
Walkosz, W, Klie, RF, Ogut, S, Mikijelj, B, Becher, PF, Borisevich, AY, Pennycook, SJ, Idrobo, JCVolume:
15
Language:
english
Journal:
Microscopy and Microanalysis
DOI:
10.1017/s1431927609095555
Date:
July, 2009
File:
PDF, 3.04 MB
english, 2009