TEM Study of Aluminum Oxynitride Films Prepared by Reactive...

Microscopy and Microanalysis 2011 / 7 Vol. 17; Iss. S2

TEM Study of Aluminum Oxynitride Films Prepared by Reactive R.F.-Sputtering

Lai, L-C, Nose, M, Chiou, W-A, Saiki, A
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Volume:
17
Language:
english
Journal:
Microscopy and Microanalysis
DOI:
10.1017/s1431927611010476
Date:
July, 2011
File:
PDF, 5.22 MB
english, 2011
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