Improved environmental stability for plasma enhanced chemical vapor deposition SiO 2 waveguides using buried channel designs
Wall, Thomas A., Chu, Roger P., Parks, Joshua W., Ozcelik, Damla, Schmidt, Holger, Hawkins, Aaron R.Volume:
55
Language:
english
Journal:
Optical Engineering
DOI:
10.1117/1.OE.55.4.040501
Date:
April, 2016
File:
PDF, 1.11 MB
english, 2016