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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Advances in Resist Materials and Processing Technology XXX - New spin-on metal hardmask materials for lithography processes
Yao, Huirong, Mullen, Salem, Wolfer, Elizabeth, Rahman, Dalil, Anyadiegwu, Clement, Mckenzie, Douglas, Dioses, Alberto, Cho, Joonyeon, Padmanaban, Munirathna, Somervell, Mark H.Volume:
8682
Year:
2013
Language:
english
DOI:
10.1117/12.2011226
File:
PDF, 1.57 MB
english, 2013