SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Design-Process-Technology Co-optimization for Manufacturability X - Characterization of shallow trench isolation CMP process and its application
Capodieci, Luigi, Cain, Jason P., Li, Helen, Zhang, ChunLei, Liu, JinBing, Liu, ZhengFang, Chen, Kuang Han, Gbondo-Tugbawa, Tamba, Ding, Hua, Li, Flora, Lee, Brian, Gower-Hall, Aaron, Chiu, Yang-ChihVolume:
9781
Year:
2016
Language:
english
DOI:
10.1117/12.2219912
File:
PDF, 2.36 MB
english, 2016