Directed self-assembly lithography for half-pitch sub-15 nm...

Directed self-assembly lithography for half-pitch sub-15 nm pattern fabrication process

Sato, Hironobu, Seino, Yuriko, Kihara, Naoko, Kasahara, Yusuke, Kobayashi, Katsutoshi, Kodera, Katsuyoshi, Kanai, Hideki, Kawamonzen, Yoshiaki, Minegishi, Shinya, Miyagi, Ken, Tobana, Toshikatsu, Hira
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Volume:
1750
Year:
2015
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/opl.2015.342
File:
PDF, 1.41 MB
english, 2015
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