Arsenic Redistribution and Outdiffusion in Implanted...

MRS Proceedings 1988 / 1 Vol. 100

Arsenic Redistribution and Outdiffusion in Implanted Czochralski-Grown P-Type Silicon During Rapid Thermal Annealing

Chaussemy, G., Canut, B., Kumar, S. N., Barbier, D., Laugier, A.
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Volume:
100
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-100-695
Date:
January, 1988
File:
PDF, 325 KB
english, 1988
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