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Submicron Roughness Determination at the Si-SiO2 Interface and Correlations to Prccessing Steps and Electronic Properties
Hahn, Peter O., Lampert, I., Schnegg, A.Volume:
105
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-105-247
Date:
January, 1987
File:
PDF, 401 KB
english, 1987