Physical and Chemical Properties of Silicon Dioxide Film Deposited by New Process
Goda, Takuji, Nagayama, Hirotsugu, Hishinuma, Akihiro, Kawahara, HideoVolume:
105
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-105-283
Date:
January, 1987
File:
PDF, 302 KB
english, 1987