Deposition and Characteristics of Polysilicon Films for...

MRS Proceedings 1987 / 1 Vol. 106

Deposition and Characteristics of Polysilicon Films for Integrated-Circuit Applications

Kamins, Ted
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Volume:
106
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-106-3
Date:
January, 1987
File:
PDF, 780 KB
english, 1987
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