Quantitative Study of Al/W Interaction In Si/SiO2/W-Ti/Al...

MRS Proceedings 1988 / 1 Vol. 119

Quantitative Study of Al/W Interaction In Si/SiO2/W-Ti/Al Thin Film System

Liu, Hung-Yu, Chang, Peng-Heng, Bohlman, Jim, Tsai, Hun-Lian
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Volume:
119
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-119-153
Date:
January, 1988
File:
PDF, 997 KB
english, 1988
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