Dependence of PECVD Silicon Oxynitride Properties on...

MRS Proceedings 1988 / 1 Vol. 131

Dependence of PECVD Silicon Oxynitride Properties on Deposition Parameters

Helms, Aubrey L., Havrilla, Robert M.
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Volume:
131
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-131-295
Date:
January, 1988
File:
PDF, 345 KB
english, 1988
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