Shallow Junction Formation in As-Implanted Si by...

Shallow Junction Formation in As-Implanted Si by Low-Temperature Rapid Thermal Annealing

El-Ghor, M. K., Pennycook, S. J., Zuhr, R. A.
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Volume:
147
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-147-19
Date:
January, 1989
File:
PDF, 1.21 MB
english, 1989
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