As and B Ion Implantation Through Mo and into Mo-Silicide...

MRS Proceedings 1989 / 1 Vol. 157

As and B Ion Implantation Through Mo and into Mo-Silicide Layers for Shallow Junction Formation

Angelucci, R., Merli, M., Solmi, S., Armigliato, A., Gabilli, E., Govoni, D., Poggi, A.
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Volume:
157
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-157-751
Date:
January, 1989
File:
PDF, 899 KB
english, 1989
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