Chemical Vapor Deposition of Niobium Carbide using a Novel...

MRS Proceedings 1989 / 1 Vol. 168

Chemical Vapor Deposition of Niobium Carbide using a Novel Organometallic Precursor.

Stupik, Paul D., Cheatham, Linda K., Graham, John J., Barron, Andrew R.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
168
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-168-363
Date:
January, 1989
File:
PDF, 176 KB
english, 1989
Conversion to is in progress
Conversion to is failed