High-Energy Low-Dose Implanted Silicon Annealed by...

MRS Proceedings 1990 / 1 Vol. 201

High-Energy Low-Dose Implanted Silicon Annealed by Transient RTA

BÁrsony, IstvÁn, Heideman, Jean-Luc, Middelhoek, Jan, Wallinga, Hans
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Volume:
201
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-201-277
Date:
January, 1990
File:
PDF, 364 KB
english, 1990
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