Suppression of Crystal Nucleation in Amorphous Si Thin...

MRS Proceedings 1990 / 1 Vol. 201

Suppression of Crystal Nucleation in Amorphous Si Thin Films by High Energy Ion Irradiation at Intermediate Temperatures

Im, James S., Shin, Jung H., Atwater, Harry A.
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Volume:
201
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-201-357
Date:
January, 1990
File:
PDF, 1.53 MB
english, 1990
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