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Material Characterization of Low-Temperature Silicon Epitaxial Growth on Patterned Oxidized Wafers by ULPCVD From SiH4/SiF4/H2
Yew, Tri-Rung, Reif, Rafael ReifVolume:
202
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-202-389
Date:
January, 1990
File:
PDF, 2.08 MB
english, 1990