Properties of in Situ Doped Amorphous and Polycrystalline Silicon Deposited by Chemical Vapor Deposition from Tertiarybutylarsine and Tertiarybutylphosph INE
Kotccki, David E., Blouse, Jeffrey L., Parks, Christopher C., Sarkozy, Robcrt F.Volume:
204
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-204-295
Date:
January, 1990
File:
PDF, 491 KB
english, 1990