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Device Application and Growth Mechanism for Hemispherical-Grained Si.
Watanabe, Hirohito, Aoto, Nahomi, Adachi, Saburo, Kikkawa, TakamaroVolume:
219
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-219-401
Date:
January, 1991
File:
PDF, 2.83 MB
english, 1991