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The Slope Etching of a-Si:H Film using CF4 + O2 Gas
Sung, Kang Hyun, Park, B. W., Kim, J. J., Kim, C. Y., Choi, J. I., Bae, H. K., Park, Y. H., Hur, C. W.Volume:
219
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-219-811
Date:
January, 1991
File:
PDF, 671 KB
english, 1991