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Stress and Resistivity in Reactively Sputtered Amorphous Metallic Ta-Si-N Films
Kwok, C.-K., Kolawa, E., Nicolet, M-A., Lee, Ray C.Volume:
226
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-226-261
Date:
January, 1991
File:
PDF, 281 KB
english, 1991