Growth of ion implanted buried FeSi2 on Si (111) and Si...

MRS Proceedings 1991 / 1 Vol. 235

Growth of ion implanted buried FeSi2 on Si (111) and Si (100)

Radermacher, K., Mantl, S., Dieker, Ch., Holzbrecher, H., Speier, W., Lüth, H.
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Volume:
235
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-235-273
Date:
January, 1991
File:
PDF, 1.08 MB
english, 1991
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