A Novel Process to Form Epitaxial Si Structures With Buried...

MRS Proceedings 1991 / 1 Vol. 235

A Novel Process to Form Epitaxial Si Structures With Buried Silicide

Erokhin, YU. N., Grotzschel, R., Oktyabrski, S. R., Roorda, S., Sinke, W., Vjatkin, A. F.
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Volume:
235
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-235-313
Date:
January, 1991
File:
PDF, 1.85 MB
english, 1991
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