Activation of the Si(100)/Cl2 Etching Reaction at High Cl2...

MRS Proceedings 1991 / 1 Vol. 236

Activation of the Si(100)/Cl2 Etching Reaction at High Cl2 Translational Energies

Campos, Francis X., Weaver, Gabriela C., Waltman, Curtis J., Leone, Stephen R.
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Volume:
236
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-236-177
Date:
January, 1991
File:
PDF, 344 KB
english, 1991
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