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Anisotropic Si Etching by a Supersonic Cl2 Beam
Teraoka, Yuden, Uesugi, Fumihiko, Nishiyama, IwaoVolume:
236
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-236-183
Date:
January, 1991
File:
PDF, 2.03 MB
english, 1991