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CHF3 and NH3 Additives for Reactive ion Etching of GaAs Using CCl2F2 and SICI4
Din, Kuen-Sane, Chi, Gou-ChungVolume:
240
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-240-373
Date:
January, 1991
File:
PDF, 252 KB
english, 1991