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Low Temperature (150–250°C) Deposition of n+ and p+ Microcrystalline Silicon for VLSI Device Contacts
Rajeswaran, G., Vanier, P. E., Kampas, F. J., Corderman, R. R.Volume:
25
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-25-563
Date:
January, 1983
File:
PDF, 1.04 MB
english, 1983