In-situ emissivity and temperature measurement during rapid...

In-situ emissivity and temperature measurement during rapid thermal processing (RTP)

Vandenabeele, P., Schreutelkamp, R. J., Maex, K., Vermeiren, C., Coppye, W.
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Volume:
260
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-260-653
Date:
January, 1992
File:
PDF, 402 KB
english, 1992
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