![](/img/cover-not-exists.png)
Temperature Dependence of the Kinetics of Silicon Amorphization by He Ion Implantation
Laânab, L., Roumili, A., Faye, M. M., Gessinn, N., Claverie, A.Volume:
279
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-279-529
Date:
January, 1992
File:
PDF, 1.09 MB
english, 1992