Reactor Issues Important for the Deposition of Selective...

MRS Proceedings 1992 / 1 Vol. 282

Reactor Issues Important for the Deposition of Selective Tungsten by Chemical Vapor Deposition Using the SiH4 Reduction of WF6

Kotecki, David E., Colgan, Evan G., Rose, Alan
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Volume:
282
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-282-371
Date:
January, 1992
File:
PDF, 426 KB
english, 1992
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