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Influence of Ion Energy in Plasma Deposition of a-Sio2 Films
Vallier, L., Joubert, O., Burke, R., Ferrieu, F., Devine, R. A. B.Volume:
284
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-284-193
Date:
January, 1992
File:
PDF, 201 KB
english, 1992