Fluorinated Gate Oxide Films Utilized in Polysilicon Thin Film Transistors
Kouvatsos, Dimitrios N., Kung, Ji-Ho, Hatalis, Miltiadis K., Jaccodine, Ralph J.Volume:
284
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-284-437
Date:
January, 1992
File:
PDF, 293 KB
english, 1992