Process Optimization for the Fabrication of the Thin PtSi Schottky Barrier Diode IRCCD
Wang, Wang-Nang, Ho, Chia, Shiue, Jee-MingVolume:
299
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-299-309
Date:
January, 1994
File:
PDF, 1.39 MB
english, 1994