A Dual-Function Uhv-Compatible Chamber for i)...

MRS Proceedings 1993 / 1 Vol. 303

A Dual-Function Uhv-Compatible Chamber for i) Low-Temperature Plasma-Assisted Oxidation, and ii) High-Temperature Rapid Thermal Processing of Si-Based Dielectric Gate Heterostructures

Hattangady, S., Xu, X-L, Watkins, M.J., Hornung, B., Misra, V., Lucovsky, G., Wortman, J.J.
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Volume:
303
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-303-339
Date:
January, 1993
File:
PDF, 432 KB
english, 1993
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