Effect of Post-Annealing on Electrical Properties of Ta2O5...

Effect of Post-Annealing on Electrical Properties of Ta2O5 Thin Film Deposited by Pecvd Using TaCl5 and N2O

Park, Jong-Wan, Han, S.W., Moon, H.S., Lee, J.S.
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Volume:
309
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-309-9
Date:
January, 1993
File:
PDF, 791 KB
english, 1993
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