Hydrogen Plasma Cleaning of the Si(100) Surface: Removal of Oxygen and Carbon and The Etching of Si
Kinosky, David, Qian, R., Mahajan, A., Thomas, S., Munguía, P., Fretwell, J., Banerjee, S., Tasch, A.Volume:
315
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-315-219
Date:
January, 1993
File:
PDF, 1011 KB
english, 1993