Heterogeneous Kinetics of The Chemical Vapor Deposition of...

MRS Proceedings 1993 / 1 Vol. 334

Heterogeneous Kinetics of The Chemical Vapor Deposition of Silicon Carbide From Methyltrichlorosilane

Papasouliotis, George D., Sotirchos, Stratis V.
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Volume:
334
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-334-111
Date:
January, 1993
File:
PDF, 499 KB
english, 1993
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