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Some Considerations of MOCVD for the Preparation of High Tc Thin Films
Hitchman, Michael L., Shamlian, Sarkis H., Gilliland, Douglas D., Cole-Hamilton, David J., Thompson, Simon C., Cook, Stephen L., Richards, Barbara C.Volume:
335
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-335-249
Date:
January, 1993
File:
PDF, 780 KB
english, 1993