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Effects of N2 Plasma Treatment on SiO2 Gate Insulator in a-Si:H Thin Film Transistor
Kim, Sung Chul, Bae, Sung Sig, Oh, Eui Yeol, Kim, Jeong Hyun, Lee, Jong Wan, Kim, Cha Yeon, Kim, DonggilVolume:
336
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-336-775
Date:
January, 1994
File:
PDF, 338 KB
english, 1994