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Low Energy Threshold in the Growth of Cubic Boron Nitride Films by ECR Plasma Assisted Magnetron Sputtering
Taylor, C. A., Kidner, S., Clarke, R.Volume:
339
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-339-345
Date:
January, 1994
File:
PDF, 919 KB
english, 1994