Rapid Thermal Annealing in Si

MRS Proceedings 1984 / 1 Vol. 35

Rapid Thermal Annealing in Si

Seidel, T.E., Pai, C.S., Lischner, D.J., Maher, D.M., Knoell, R.V., Williams, J.S., Penumalli, B.R., Jacobson, D.C.
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Volume:
35
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-35-329
Date:
January, 1984
File:
PDF, 523 KB
english, 1984
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