Step Coverage and Material Properties of CVD Titanium Nitride Films from TDMAT and TDEAT Organic Precursors
Toprac, Anthony J., Wang, Shi-Qing, Musher, Joshua, Gordon, Roy G.Volume:
355
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-355-323
Date:
January, 1994
File:
PDF, 309 KB
english, 1994