Microcrystalline β-SiC Growth on Si by ECR-CVD at 500°C

MRS Proceedings 1994 / 1 Vol. 358

Microcrystalline β-SiC Growth on Si by ECR-CVD at 500°C

Cheng, Kuan-Lun, Liu, Chih-Chien, Cheng, Huang-Chung, Lee, Chiapyng, Yew, Tri-Rung
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Volume:
358
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-358-799
Date:
January, 1994
File:
PDF, 1.13 MB
english, 1994
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