Annealing and Diffusion of Boron in Self-Implanted Silicon...

MRS Proceedings 1984 / 1 Vol. 36

Annealing and Diffusion of Boron in Self-Implanted Silicon by Furnace and Electron Beam Heating

Godfrey, D. J., McMahon, R. A., Hasko, D. G., Ahmed, H., Dowsett, M. G.
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Volume:
36
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-36-143
Date:
January, 1984
File:
PDF, 1.88 MB
english, 1984
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