Surface Photovoltage Monitoring of Silicon Surface Native and Chemical Oxides following Wafer Cleaning and Rinsing Operations
Rosato, John J., Hall, R. Mark, Parry, Thad B., Lindquist, Paul G., Jarvis, Taura D.Volume:
386
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-386-47
Date:
January, 1995
File:
PDF, 1.64 MB
english, 1995