![](/img/cover-not-exists.png)
Integrated Processing of Silicon Oxynitride Alloy Dielectrics by Plasma-Assisted Oxidation, Chemical Vapor Deposition, and On-Line Rapid Thermal Annealing
Hattangady, S. V., Niimi, H., Gandhi, S., Lucovsky, G.Volume:
387
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-387-213
Date:
January, 1995
File:
PDF, 330 KB
english, 1995