Manufacturability Issues for Application of Silicides In 0.25 μm CMOS Process and Beyond
Wang, Q. F., Lauwers, A., Jonckx, F., de Potter, M., Chen, Chun-Cho, Maex, K.Volume:
402
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-402-221
Date:
January, 1995
File:
PDF, 1.22 MB
english, 1995