The Use of Disordered Interlayers to Enhance Nucleation of...

The Use of Disordered Interlayers to Enhance Nucleation of Silicon Nitride During Chemical Vapor Deposition

Boekenhauer, Rachel E., Lauten, Frederick S., Sheldon, Brian W.
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Volume:
403
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-403-107
Date:
January, 1995
File:
PDF, 1.47 MB
english, 1995
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