The Use of Disordered Interlayers to Enhance Nucleation of Silicon Nitride During Chemical Vapor Deposition
Boekenhauer, Rachel E., Lauten, Frederick S., Sheldon, Brian W.Volume:
403
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-403-107
Date:
January, 1995
File:
PDF, 1.47 MB
english, 1995