On the Effect of Substrate Temperature on a-Si:H Deposition...

MRS Proceedings 1996 / 1 Vol. 420

On the Effect of Substrate Temperature on a-Si:H Deposition Using an Expanding Thermal Plasma

Severens, R. J., Sanden, M. C. M. Van De, Verhoeven, H. J. M., Bastiaanssen, J., Schram, D. C.
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Volume:
420
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-420-341
Date:
January, 1996
File:
PDF, 887 KB
english, 1996
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